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國產(chǎn)化進程再加速!山東力冠自主研發(fā)12英寸立式爐新品正式發(fā)布

2025-07-31


國產(chǎn)化進程再加速!山東力冠自主研發(fā)12英寸立式爐新品正式發(fā)布

 

2025年7月31日,山東力冠微電子裝備有限公司(以下簡稱“山東力冠”)正式宣布,其自主研發(fā)的首款12英寸(300mm)立式爐設備成功面市并投入市場。這是公司在高端半導體熱處理設備領域取得的又一重大突破,彰顯了山東力冠在推動核心半導體裝備國產(chǎn)化替代道路上的堅實步伐與創(chuàng)新能力。

該款12英寸立式爐新品專為滿足先進集成電路制造中對薄膜沉積、氧化、退火等關鍵高溫工藝的嚴苛需求而設計。經(jīng)過1000多個日夜持續(xù)的技術(shù)攻堅,10000多個小時的測試驗證,山東力冠在多個核心性能指標上實現(xiàn)了顯著提升:

卓越的溫度均勻性與穩(wěn)定性:
確保晶圓片間及片內(nèi)工藝結(jié)果的高度一致性。

 

精準的氣體流量控制系統(tǒng):

滿足復雜工藝對氣體配比和流量的精密控制要求。

 

優(yōu)化的產(chǎn)能與可靠性:

設計旨在提升設備運行效率(UPH)和長期運行的穩(wěn)定性,為客戶降低綜合擁有成本。

 

山東力冠負責人表示,“它不僅僅是一款新產(chǎn)品,更是我們解決半導體制造關鍵設備‘卡脖子’難題的決心體現(xiàn)。我們將持續(xù)加大研發(fā)投入,深耕核心技術(shù),致力于為國內(nèi)晶圓制造廠提供性能卓越、穩(wěn)定可靠且更具競爭力的國產(chǎn)高端裝備,為中國半導體產(chǎn)業(yè)的自主可控與升級發(fā)展貢獻‘力冠’力量。”

 

該設備的成功研發(fā)與推出,不僅豐富了山東力冠在半導體前道設備領域的產(chǎn)品線,顯著提升了公司在高端市場的競爭實力,更直接響應了當前國內(nèi)半導體產(chǎn)業(yè)鏈對設備本土化的迫切需求。據(jù)悉,該設備即將進入國內(nèi)主流芯片制造產(chǎn)線進行客戶驗證。

 

 

Localization Milestone Achieved! Shandong Liguan Launches Self-Developed 12-Inch Vertical Furnace.

 

July 31, 2025 – Shandong Liguan Microelectronics Equipment Co., Ltd. (hereinafter referred to as "Shandong Liguan") officially announces the successful market launch of its first independently developed 12-inch (300mm) vertical furnace, marking a significant breakthrough in high-end semiconductor thermal processing equipment. This achievement underscores the Company’s commitment to advancing localized alternatives for core semiconductor manufacturing equipment through innovation and technological prowess.

 

The 12-inch vertical furnace is designed for advanced IC manufacturing, addressing critical high-temperature processes such as thin-film deposition, oxidation, and annealing with stringent performance requirements. After 1,000+ days of R&D and 10,000+ hours of rigorous testing, the system demonstrates notable improvements in key specifications:

 

Superior Temperature Uniformity & Stability:

Ensures wafer-to-wafer (WTW) and within-wafer (WIW) process uniformity.

 

Precision Gas Delivery System:

Enables accurate gas mixing ratios and flow control for complex processes.

 

Enhanced Productivity & Reliability:

Optimized for high UPH and MTBF, reducing total cost of ownership (TCO).

A Company representative emphasized, "This is more than a new product—it represents our resolve to chokehold technologies in semiconductor equipment. We will continue to increase R&D investment, deepen core technological expertise, and provide domestic wafer fabs with high-performance, reliable, and competitive localized high-end solutions, contributing 'Liguan's strength' to China’s semiconductor self-sufficiency and industrial advancement."

 

The successful development and launch of this equipment not only expands Shandong Liguan’s product portfolio in front-end semiconductor equipment but also significantly strengthens its competitiveness in the high-end market. More importantly, it directly addresses the urgent need for equipment localization in China’s semiconductor supply chain. It is reported that the tool will soon enter customer validation in mainstream domestic chip production lines.

 

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